Electrodeposited Extended and Laterally Confined Metal / n - Si (111) Contacts

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© 2007 ECS - The Electrochemical Society
, , Citation Philipp Hugelmann et al 2007 ECS Trans. 3 77 DOI 10.1149/1.2721520

1938-5862/3/21/77

Abstract

Au / n - Si (111) contacts have been electrochemically deposited and studied by in - situ Scanning Tunneling Microscopy (STM). The initial nucleation step results in clusters showing a few nanometers in diameter, which grow subsequently to large extended metal films. A Schottky barrier is formed at the interface to n - Si (111), as determined by in - situ transport measurements.

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10.1149/1.2721520