Abstract
ZnO films with various thicknesses (0.4, 0.6, 0.8, 1 and 1.3 μm) had been prepared on PPC plastic bases by using DC sputtering. XRD results showed that all the films displayed principally ZnO (002) peak at 2θ = 34.115°, 34.01, 34.16, 34.07 and 34.12° with FWHM of 0.41°, 0.34, 0.27, 0.21 and 0.368° respectively, which is coincide with wurtzite hexagonal phase, indicated that films were preferentially grown along c-axis. XRD results also showed that the lattice constant and the crystallite size for the deposited thin films became larger than those for the thick film 1.3 μm; while the stress and microstrain increased for the thick films.
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