Paper • The following article is Open access

Production of porous films of silicate glass using a plasma focus setup

, , and

Published under licence by IOP Publishing Ltd
, , Citation V N Kolokoltsev et al 2021 J. Phys.: Conf. Ser. 1758 012016 DOI 10.1088/1742-6596/1758/1/012016

Download Article PDF

Article metrics

76 Total downloads

Share this article

Author affiliations

1 A.A. Baikov Institute of Metallurgy and Materials Science of RAS, Leninsky pr., 49, Moscow, Russia

2 P.N. Lebedev Physical Institute of RAS, Leninsky pr., 53, Moscow, Russia

Buy this article in print

Journal RSS
Sign up for new issue notifications
1742-6596/1758/1/012016

Abstract

The aim of the work was to obtain and study films of porous silicate glass. The proposed method for producing porous films is based on the rapid cooling of the melt on the surface of a glass plate after exposure to short pulses of argon plasma generated on an electrodischarge installation of plasma focus type. Silicate glass films obtained by such method have the properties of both porous glasses and foam glass. The specific volume density of these films is ∼ 0.4 g/cm3, their porosity and hygroscopicity correspondingly ∼ 0.3 and ∼ 30%

Export citation and abstract BibTeX RIS

Previous article in issue
Next article in issue

Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.

Please wait… references are loading.
10.1088/1742-6596/1758/1/012016