PREFACE

NC-AFM 2005: Proceedings of the 8th International Conference on Non-Contact Atomic Force Microscopy

Published under licence by IOP Publishing Ltd
, , Citation M Reichling and W Mikosch 2006 Nanotechnology 17 E01 DOI 10.1088/0957-4484/17/7/E01

0957-4484/17/7/E01

Abstract

The 8th International Conference on Non-Contact Atomic Force Microscopy, held in Bad Essen, Germany, from 15 18th August 2005, attracted a record breaking number of participants presenting excellent contributions from a variety of scientific fields. This clearly demonstrated the high level of activity and innovation present in the community of NC-AFM researchers and the continuous growth of the field. The strongest ever participation of companies for a NC-AFM meeting is a sign for the emergence of new markets for the growing NC-AFM community; and the high standard of the products presented at the exhibition, many of them brand-new developments, reflected the unbroken progress in technology. The development of novel technologies and the sophistication of known techniques in research laboratories and their subsequent commercialization is still a major driving force for progress in this area of nanoscience. The conference was a perfect demonstration of how progress in the development of enabling technologies can readily be transcribed into basic research yielding fundamental insight with an impact across disciplines.

The NC-AFM 2005 scientific programme was based on five cornerstones, each representing an area of vivid research and scientific progress. Atomic resolution imaging on oxide surfaces, which has long been a vision for the catalysis community, appears to be routine in several laboratories and after a period of demonstrative experiments NC-AFM now makes unique contributions to the understanding of processes in surface chemistry. These capabilities also open up new routes for the analysis of clusters and molecules deposited on dielectric surfaces where resolution limits are pushed towards the single atom level. Atomic precision manipulation with the dynamic AFM left the cradle of its infancy and flourishes in the family of bottom-up fabrication nanotechnologies. The systematic development of established and the introduction of new concepts of contrast formation allow the highly resolved measurement of a number of physical properties far beyond the determination of surface topography. The development of techniques allowing atomic resolution dynamic mode imaging in liquids pushes the door open for an atomic precision analysis of biological samples under physiological conditions. In each of these fields, the conference demonstrated cutting-edge results and also provided perspectives for the next steps on the roadmap of NC-AFM towards the development of its full extent.

The conference in Bad Essen was made possible by the continuous dedication of the local management and we are most grateful to Frauke Riemann, Joachim Fontaine and the members of the supporting team for the smooth organization. We gratefully appreciate the financial support of the exhibitors, namely Anfatec, HALCYONICS, JEOL, LOT-Oriel, NanoMagnetics, NT-MDT, Omicron, Schaefer Technology, SURFACE, UNISOKU and the local sponsors which enabled us to provide free participation at the conference for ten promising young researchers who had submitted excellent contributions.

It was a great pleasure for us to continue our most successful collaboration with Nanotechnology as our partner for the proceedings publication and we would like to thank Ian Forbes and the publishing team for the professional handling of the peer review and all production matters.

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10.1088/0957-4484/17/7/E01