The range profile of the most abundant stable boron isotope, 11B, implanted into three wafers made of the three stable silicon isotopes, 28Si, 29Si and 30Si, in the energy range between 0.4 to 2.0 MeV, has been studied by the Monte Carlo program TRIM. It is found that the implantation profile depends strongly on the isotopic state of the silicon wafer. Also, it is concluded that the presence of the least abundant stable silicon isotope, 30Si, in a silicon wafer of natural abundance, influences the shallow tail of the implantation profile.