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Buried Optical Waveguides of Porous Silicon

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Copyright (c) 1998 The Japan Society of Applied Physics
, , Citation Morio Takahashi Morio Takahashi et al 1998 Jpn. J. Appl. Phys. 37 L1017 DOI 10.1143/JJAP.37.L1017

1347-4065/37/9A/L1017

Abstract

It is demonstrated that the refractive-index-controllable nature of luminescent porous silicon (PS) is directly applicable to the development of a three-dimensionally buried optical waveguide. The PS waveguide is fabricated on a p-type silicon wafer by monolithic processes such as photolithography, ion implantation, anodization, and thermal oxidation. An induced high contrast of refractive indices leads to efficient confinement and propagation of visible light. When the active core layer is partially excited by a He-Cd (325 nm) laser, blue emission is observed from a cleaved facet. The PS waveguide is potentially useful as a component of silicon-based photonic integration.

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10.1143/JJAP.37.L1017