We have developed a simulation model of the implantation
of a negative charge into an insulating target by a fixed and
well-focused high-energy electron beam. We are particularly
interested in the evolution of the distribution of the charges
trapped during the bombardment.
Our simulation is based on a Monte Carlo method
permitting us to account for the various electron-insulator
interactions. The charge carriers, unless they are emitted into
vacuum, are followed until they have lost most of their kinetic
energy. After that, they drift along the internal electric field
lines before getting trapped. The field generated by these
trapped charges is calculated self-consistently by solving the
appropriate Poisson equation.
When the trapping site density is sufficiently high, the
dynamics of the charge is principally governed by the
self-regulation of the total secondary emission yield. The total
number of implanted charges is therefore limited and a
quasi-stationary regime arises.
The charge distribution builds up, forming a negative
semi-ellipsoidal shell whose extent is directly related to
the maximum penetration of the primary electrons. The internal
region corresponds to a mixing zone with a weak positive mean
charge. This characteristic distribution appears at all the
primary beam energies considered.
On the other hand, when the trapping site density is too
low, the whole region under the beam is saturated and the mixing
zone is completely occupied by electrons before the
self-regulation of the total secondary yield acts.