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Retraction: "Depth Profile Characterization of Spin-Coated Poly(3,4-ethylenedioxythiophene):Poly(styrene sulfonic acid) Films for Thin-Film Solar Cells during Argon Plasma Etching by Spectroscopic Ellipsometry"

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Published 19 July 2016 © 2016 The Japan Society of Applied Physics
, , Citation Tomohisa Ino et al 2016 Jpn. J. Appl. Phys. 55 089201 DOI 10.7567/JJAP.55.089201

This is a retraction for 2011 Jpn. J. Appl. Phys. 50 08JG02

1347-4065/55/8/089201

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The authors hereby retract the above article. The retraction has been agreed between the authors because the same contents have already been published in the articles of the different journals.1,2)

10.7567/JJAP.55.089201