Atomic Vapor Deposition and Atomic Layer Deposition of High-k and Electrode Materials

Michael Heuken, Ulrich Weber, Peer Lehnen, Peter K. Baumann, Yoshi Senzaki, Johannes Lindner, Brian Lu and Ziaul Karim

© 2010 ECS - The Electrochemical Society
ECS Meeting Abstracts, Volume MA2010-01, E1 - Advanced Gate Stack, Source / Drain, and Channel Engineering for Si-Based CMOS 6: New Materials, Processes, and EquipmentCitation Michael Heuken et al 2010 Meet. Abstr. MA2010-01 929DOI 10.1149/MA2010-01/17/929