As Depth Profiling in Si Ultrashallow Junctions: Comparison of Three Different Experimental Determinations.

Andrea Parisini¹, Vittorio Morandi¹, Jaap Van den Berg², Michael A. Reading², Damiano Giubertoni³, Paul Bailey⁴ and Tim Noakes⁴

© 2009 ECS - The Electrochemical Society
ECS Meeting Abstracts, Volume MA2009-02, E1 - Analytical Techniques for Semiconductor Materials and Process Characterization 6 Citation Andrea Parisini et al 2009 Meet. Abstr. MA2009-02 2007 DOI 10.1149/MA2009-02/22/2007