Application of Ion Implantation/RBS to the Study of Electrocatalysis: Comparison of Chlorine Evolution at Ir‐implanted and Ru‐implanted Titanium Electrodes

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© 1990 ECS - The Electrochemical Society
, , Citation Eugene J. Kelly et al 1990 J. Electrochem. Soc. 137 2482 DOI 10.1149/1.2086973

1945-7111/137/8/2482

Abstract

Ir‐implanted titanium near‐surface alloys were prepared by ion implantation, characterized (Ir concentration/depth profiles) by Rutherford backscattering (RBS), and subsequently anodically oxidized to form electrocatalytically active electrodes. The electrochemical behavior of the metallic‐like electrodes in acidic chloride, sulfate, and perchlorate solutions was investigated, and the results compared with those previously obtained with similarly prepared electrodes. For both electrodes, , the Tafel slope for the evolution reaction is 40 mV, i.e., . The reaction order with respect to chloride ion concentration, , approaches limiting values of 1.0 and 2.0 at high and low chloride ion concentrations, respectively, i.e., , where for and for . A modified Volmer‐Heyrovsky mechanism, one in which the role of adsorbed chloride ions is taken into account, is shown to be consistent with the aforementioned diagnostic parameters. A correlation of the rate of evolution with the M‐implant profiles enabled the determination of the instantaneous in situ surface concentration of the catalytically active M(IV) component of the electrodes. This, in turn, enabled the evaluation of the specific catalytic activities (rate per catalyst surface site) of and , and their relative catalytic activity. is only 45% as effective a catalyst for evolution as , but it is far more stable, i.e., its corrosion rate is only ∼5% that of.

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10.1149/1.2086973