This site uses cookies. By continuing to use this site you agree to our use of cookies. To find out more, see our Privacy and Cookies policy. Close this notification
Skip to content

Thin Films of Amorphous Germanium‐Tin Alloys Prepared by Radio‐Frequency Magnetron Sputtering

and

© 1998 ECS - The Electrochemical Society
, , Citation Toshiro Maruyama and Hisao Akagi 1998 J. Electrochem. Soc. 145 1303 DOI 10.1149/1.1838455

1945-7111/145/4/1303

Abstract

Thin films of amorphous germanium‐tin alloy have been prepared by sputtering germanium and tin targets with argon in a radio‐frequency magnetron sputtering system. X‐ray diffraction reveals that the film for x < 0.38 is amorphous but that crystalline β‐Sn is formed in the amorphous film for x ≧ 0.38. The optical energy gap is expressed by [eV] for x < 0.38. The equation also correlates the pseudo‐optical energy gap for the GeSn‐β‐Sn composite film.

Export citation and abstract BibTeX RIS

10.1149/1.1838455