Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist

The resist materials are evaluated using their resolution, line edge roughness (LER), and sensitivity. However, the evaluation of chemically amplified resists is tricky because of the trade-off relationships between resolution, LER, and sensitivity. In this study, we investigated a chemically amplified resist with a fullerene matrix by analyzing the dose-pitch matrices of line width and LER. The effective quencher concentration of the fullerene resist obtained by the analysis was higher than those of typical polymer-type resists. This suggests that the quantum efficiency of acid generation in the fullerene matrix is slightly lower than those of polymer-type resists. The effective reaction radius was 0.06 nm, which was smaller than those of polymer-type resists. The proportionality constant between LER and the chemical gradient of the fullerene resist was smaller than those of polymer-type resists, probably owing to its molecular size.