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Thermal Analysis of Degradation in Ga2O3–In2O3–ZnO Thin-Film Transistors

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Published 8 August 2008 Copyright (c) 2008 The Japan Society of Applied Physics
, , Citation Mami Fujii et al 2008 Jpn. J. Appl. Phys. 47 6236 DOI 10.1143/JJAP.47.6236

1347-4065/47/8R/6236

Abstract

Degradation of Ga2O3–In2O3–ZnO (GIZO) thin-film transistors (TFTs), which are promising for driving circuits of next-generation displays, was studied. We found a degradation mode that was not observed in silicon TFTs. A parallel shift without any change of the transfer curve was observed under gate voltage stress. Judging from the bias voltage dependences we confirmed that the mode was mainly dominated by a vertical electric field. Thermal distribution was measured to analysis the degradation mechanism. Joule heating caused by drain current was observed; however, a marked acceleration of degradation by drain bias was not found. Therefore, we concluded that Joule heating did not accelerate degradation. Recovery of electrical properties independent of stress voltage were observed.

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10.1143/JJAP.47.6236