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Room Temperature 1.6 µm Electroluminescence from a Si-Based Light Emitting Diode with β-FeSi2 Active Region

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Copyright (c) 2000 The Japan Society of Applied Physics
, , Citation Takashi Suemasu Takashi Suemasu et al 2000 Jpn. J. Appl. Phys. 39 L1013 DOI 10.1143/JJAP.39.L1013

1347-4065/39/10B/L1013

Abstract

Room temperature electroluminescence (EL) was obtained for the first time from a Si-based light emitting diode with semiconducting silicide (β-FeSi2) active region. The peak wavelength was 1.6 µm and it is from β-FeSi2 balls embedded in a Si p-n junction. An a-axis oriented β-FeSi2 layer was grown on n+-(001) Si by reaction deposition epitaxy (RDE), then p- and p+-Si layers were grown by molecular beam epitaxy (MBE). The β-FeSi2 aggregated into balls with about 100 nm diameter in this process. The EL intensity increased superlinearly with increase of the injected current density, and reasonable EL was obtained at current density above 10 A/cm2, though the photoluminescence (PL) was difficult to be detected at room temperature.

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10.1143/JJAP.39.L1013