Surface Acoustic Wave Semiconductor Coupled Devices Employing Epitaxial Lift-Off Films

, , and

Copyright (c) 1996 The Japan Society of Applied Physics
, , Citation Kohji Hohkawa et al 1996 Jpn. J. Appl. Phys. 35 3015 DOI 10.1143/JJAP.35.3015

1347-4065/35/5S/3015

Abstract

We present high-performance surface acoustic wave semiconductor coupled devices in which highly functional compound semiconductor devices and highly efficient surface acoustic wave devices are monolithically integrated on the same substrate using epitaxial lift-off films. We investigated the optimal conditions for lift-off and bonding processes and succeeded in fabricating a quasi-monolithic structure without any damage in semiconductor films. We also investigated basic integrated circuit fabrication processes such as patterning and etching of the quasi-monolithic substrate. The bonded film is stable and rugged enough against these processes and the substrate can be handled as a monolithic substrate. Based on our experimental results, we confirmed that fabricating high performance functional devices is feasible.

Export citation and abstract BibTeX RIS

10.1143/JJAP.35.3015