Optical Characterization of Si1-xCx/Si ( 0≤x≤0.014) Semiconductor Alloys

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Copyright (c) 1995 The Japan Society of Applied Physics
, , Citation Hosun Lee et al 1995 Jpn. J. Appl. Phys. 34 L1340 DOI 10.1143/JJAP.34.L1340

1347-4065/34/10B/L1340

Abstract

We have characterized the optical properties of heteroepitexial Si1-xCx/Si (0≤x≤0.014) alloys grown on Si substrates by solid phase epitaxy using spectroscopic ellipsometry and photoluminescence. The measured dielectric function confirms that the samples are of good crystalline quality. The 14-K photoluminescence spectra of Si1-xCx/Si show several defect peaks. After hydrogen passivation, we observed a new peak near 1.15-1.17 eV which increases in energy with the incorporation of carbon. We tentatively assign this peak to the no-phonon peak of the Si1-xCx epi-layer. We discuss the alloy shift of the observed spectroscopic features in terms of the C-induced change in the Si indirect band gap.

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10.1143/JJAP.34.L1340