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Synthesis of Metastable GexSn1-x Alloys by Chemical Sputtering in H2

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Copyright (c) 1989 The Japan Society of Applied Physics
, , Citation Kouichi Ishida et al 1989 Jpn. J. Appl. Phys. 28 L125 DOI 10.1143/JJAP.28.L125

1347-4065/28/1A/L125

Abstract

Thin films of metastable alloy GexSn1-x(0≦x≦1) are formed by chemical sputtering in H2 on glass and semiconducting crystalline substrates. X-ray diffraction indicates the formation of microcrystalline GexSn1-x alloy films with a diamond structure. GexSn1-x films deposited on InSb(x=0) and GaSb(x=0.47) substrates with lattice matches consist of polycrystals and are shown to have a crystal orientation nearly aligned to the substrate by RHEED observations. The chemical sputtering technique is appropriate for synthesizing GexSn1-x alloys which might have potential as direct and narrow band gap materials.

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10.1143/JJAP.28.L125