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Plasma Etching of SiO2 Relief Having Tapered Wall
Hideaki Itakura1, Hiroyoshi Komiya1 and Hiroyasu Toyoda1
Copyright (c) 1980 The Japan Society of Applied Physics
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Citation Hideaki Itakura et al 1980 Jpn. J. Appl. Phys. 19 1429
DOI 10.1143/JJAP.19.1429
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