Plasma Etching of SiO2 Relief Having Tapered Wall

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Copyright (c) 1980 The Japan Society of Applied Physics
, , Citation Hideaki Itakura et al 1980 Jpn. J. Appl. Phys. 19 1429 DOI 10.1143/JJAP.19.1429

1347-4065/19/7/1429

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