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Air-Gap Capacitance–Voltage Analyses of p-InP Surfaces Covered with Natural Oxide

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Published 22 October 2010 ©2010 The Japan Society of Applied Physics
, , Citation Toshiyuki Yoshida and Tamotsu Hashizume 2010 Appl. Phys. Express 3 116601 DOI 10.1143/APEX.3.116601

1882-0786/3/11/116601

Abstract

Air-gap capacitance–voltage (CV) characteristics of p-InP surfaces covered with natural oxide and treated with hydrogen–fluoride (HF) acid are reported for the first time. These surfaces show deep-depletion CV behavior with large and distinctive hysteresis. To interpret the obtained CV curves, a model was used that introduced a donor-like discrete level in the band-gap. Another assumption in this model is that the capture velocity of the discrete level and/or the generation–recombination rate of the minority carrier of the substrate is very low. By use of this model, the measured air-gap CV curve was successfully reproduced.

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10.1143/APEX.3.116601