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Molecular-beam epitaxy of monolayer and bilayer WSe2: a scanning tunneling microscopy/spectroscopy study and deduction of exciton binding energy

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Published 25 June 2015 © 2015 IOP Publishing Ltd
, , Transition Metal Dichalcogenides Citation H J Liu et al 2015 2D Mater. 2 034004 DOI 10.1088/2053-1583/2/3/034004

2053-1583/2/3/034004

Abstract

Interest in two-dimensional (2D) transition-metal dichalcogenides (TMDs) has prompted some recent efforts to grow ultrathin layers of these materials epitaxially using molecular-beam epitaxy (MBE). However, growths of monolayer (ML) and bilayer (BL) WSe2—an important member of the TMD family—by the MBE method remain uncharted, probably because of the difficulty in generating tungsten fluxes from the elemental source. In this work, we present a scanning tunneling microscopy and spectroscopy (STM/S) study of MBE-grown WSe2 ML and BL, showing atomically flat epifilm with no domain boundary (DB) defect. This contrasts epitaxial MoSe2 films grown by the same method, where a dense network of the DB defects is present. The STS measurements of ML and BL WSe2 domains of the same sample reveal not only the bandgap narrowing upon increasing the film thickness from ML to BL, but also a band-bending effect across the boundary (step) between ML and BL domains. This band-bending appears to be dictated by the edge states at steps of the BL islands. Finally, comparison is made between the STS-measured electronic bandgaps with the exciton emission energies measured by photoluminescence, and the exciton binding energies in ML and BL WSe2 (and MoSe2) are thus estimated.

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1. Introduction

Two-dimensional (2D) transition-metal dichalcogenides (TMDs) have sizable energy bandgaps, strong spin–orbit coupling, and valley-contrasted properties. They offer new platforms for exploring low-dimensional physics and promise ultrathin or 2D electronics, optoelectronics, and the emerging spin-and valley-tronic applications [1]. Soon after the first successful isolation by exfoliation of the MoS2 monolayer (ML, defined hereafter as the X-M-X trilayer, where X stands for the chalcogen atom and M refers to the metal) [2], fabrications of ultrathin TMD films by some more controlled methods, such as hydrothermal synthesis [3], chemical vapor deposition [4, 5], and molecular-beam epitaxy (MBE) [610], have been attempted. With the advantage of thickness and doping controls and the readily available surface characterization tools in situ, the MBE method has drawn increasing attention for the growth of ultrathin TMD layers for some surface and electronic studies. Indeed, MBE growths of ML and bilayer (BL, i.e., two X-M-X trilayers) MoSe2 have been reported by a few groups [610]. In contrast, MBE growth of WSe2, another important member of the TMD family, remains uncharted. Intriguingly, the as-grown ultrathin MoSe2 films have been shown to contain dense networks of inversion domain boundary (DB) defects, which give rise to mid-gap states with electronic, optical, and catalytic consequences. Therefore, it will be of great fundamental and application interest to examine the characteristics of the MBE-grown TMD films other than MoSe2. In this work, we demonstrate MBE-grown WSe2 epifilms free from the DB network. Background doping in the as-grown film is low, indicating better quality than as-grown MoSe2 samples. Differential conductance (dI/dV) spectra taken by scanning tunneling spectroscopy (STS) measurements of both ML and BL WSe2 reveal not only bandgap narrowing upon film thickness increase from ML to BL, but also a band-bending effect towards the boundaries (steps) between ML and BL domains of the same sample. Finally, by comparing the STS-measured electronic energy bandgaps with exciton emission energies in photoluminescence (PL) spectra, exciton binding energies of ML and BL WSe2 are deduced. For completeness, results of ML and BL MoSe2 are also presented.

2. Experimental setup

Growths of WSe2 (and MoSe2) ultrathin films were carried out in a customized Omicron MBE system with the base pressure of in the low 10−10 mbar range. Elemental W and Mo metal wires were used as the metal sources in the EFM-3 e-beam evaporators (without ion filtering) from Omicron NanoTechnology GmbH, while the elemental Se source in a dual-filament Knudsen cell was heated to 120 °C with the 'hot-lip' temperature set at 220 °C in order to prevent Se condensation at the cell orifice. The fluxes of the metal sources were calibrated by the built-in flux monitors in the e-beam evaporators, and that of Se was estimated by the beam-equivalent pressure (BEP) measured using a beam flux monitor at the sample position. During film deposition, the BEP of Se was about 1.1 × 10−6 mbar while the background pressure in the chamber was ∼1.2 × 10−8 mbar. The metal-to-Se flux ratio was 1:15, and the deposition rate was 0.5 MLs/hr, according to post-growth coverage/thickness measurements of the deposits. Freshly cleaved, highly ordered pyrolytic graphite (HOPG) substrate was degassed in the ultrahigh vacuum (UHV) chamber overnight and flashed at 550 °C before commencing the MBE experiment at 300–450 °C. The substrate temperature was estimated by the power given to the heating filaments (W) in the sample manipulator, which had been calibrated by the melting points of three high-purity (>4 N) elements of indium (156.60 °C), selenium (217 °C), and bismuth (271.5 °C) [11] placed on the surface of a HOPG wafer. During deposition, the sample surfaces were monitored in situ by reflection high-energy electron diffraction (RHEED) operated at 10 keV. The observation of the streaky RHEED patterns indicated the layer-by-layer growth mode of WSe2 (and MoSe2) on HOPG. After a preset coverage of the film was deposited, the source fluxes were stopped by closing the mechanical shutters in front of the source cells, and, in the meantime, the sample was cooled naturally to room temperature (RT) for subsequent scanning tunneling microscopy (STM) experiments at RT in an adjacent UHV chamber using an Omicron VTSTM facility. Afterwards, the sample was transferred back into the MBE reactor for deposition at RT of an amorphous Se 'capping' layer. It was then taken out of the UHV and transported to a separate Unisoku low-temperature (LT) STM system for LT-STM/S measurements at 4 K or 77 K. Prior to the LT-STM/S experiments, however, the Se capping layer was thermally desorbed at ∼200 °C for half an hour, which was confirmed by the recovery of the sharp and streaky RHEED patterns as well as the revelation of the same step-and-terrace morphology of the surface by STM. For all STM/S measurements, the constant current mode was adopted. In addition, the STS measurements were performed using the lock-in technique with the modulation voltage 15 mV and frequency 985 Hz. Each STS curve presented in the following (and in the supplementary materials) represents an average of 50 measurements at the same location of the sample and for the same constant tip-sample distance.

PL experiments of ML and BL WSe2 and MoSe2 were carried out with a confocal-like setup with an excitation source of 532 nm at temperatures of 10–300 K. Instead of the MBE-grown samples, atomically thin flakes exfoliated from bulk single crystals on 300 nm-SiO2-capped Si wafers were used for the PL experiments. This was because the PL from the MBE films was fully quenched by the HOPG substrate. Although non-ideal, comparison between the PL emission peak energies and the STS-measured electronic bandgaps would allow us to perform order-of-magnitude estimates of exciton binding energies in both ML and BL WSe2 and MoSe2.

3. Results and discussions

3.1. STM/S of ML and BL WSe2 and a comparison with MoSe2

Figure 1(a) presents an STM image of an as-grown WSe2 film of nominal thickness of 1.2 MLs. The film is predominantly ML WSe2, but there is also appreciable coverage of BL domains/islands and holes of exposed substrate due to the kinetics of the MBE process. The terrace-and-step morphology of the surface and the streaky RHEED pattern (see inset) suggest layer-by-layer growth mode of WSe2 on HOPG resembles that of MoSe2 growth on the same substrate [12]. However, we note a striking difference between epitaxial WSe2 and MoSe2. As reported in an early publication, the MBE-grown MoSe2 film often contains a high density of the DB defects intertwined into a triangular network [7]. These DB defects manifest in the STM micrographs as bright lines when imaged at the bias conditions, corresponding to the gap region of MoSe2 (see figure 3(a) below). In epitaxial WSe2, on the other hand, no such bright line is found. In the atomic-resolution STM image of figure 1(b), one only observes regular moiré patterns due to the lattice misfit between WSe2 and graphite but no sign of the DB defect. Given the same crystal structure and similar lattice parameters between WSe2 and MoSe2, it is somewhat surprising that the two materials behave so differently during MBE growth on HOPG. The WSe2 film is thus more attractive and advantageous for studying the intrinsic properties of ultrathin TMDs.

Figure 1.

Figure 1. STM/S of MBE-grown ML and BL WSe2. (a) STM micrograph (size: 75 × 75 nm2, sample bias: 2.4 V) of an MBE-grown WSe2 film with the nominal thickness of 1.2 MLs, showing ML and BL domains. Holes of the exposed substrate surface are also visible. The inset shows the RHEED pattern taken along $\left[11\bar{2}0\right]$ of the surface. (b) A close-up, atomic resolution STM image (size: 7.5 × 7.5 nm2, sample bias: 0.8 V) of the ML WSe2 domain of the sample, revealing the moiré pattern but no line defect. (c) STS differential conductance spectra of both ML (black) and BL (green) WSe2; each represents an average of 50 measurements at fixed locations on the sample and the same tip-sample distance. The critical point energies are indicated by solid (for ML) and dashed (for BL) arrows. (d, e) Theoretical band structures of ML and BL WSe2, respectively, calculated by the DFT, in which the critical points are labelled.

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In figure 1(c), we present two differential conductance spectra obtained by the STS measurements on the ML and BL regions of the same sample and at fixed positions far from steps. Both curves reveal a semiconductor property with sizable energy gaps. The Fermi level (0 eV) is found close to the middle of the energy gaps, indicative of low background doping of the film. This also contrasts the MoSe2 film grown by MBE, which is often electron-doped, and the Fermi level is close to the conduction band edge (refer to figure 3(b)). Comparing the two spectra in figure 1(c), one clearly notes a gap-narrowing effect upon the film thickness increase from ML to BL.

We follow the method of references [8, 10] (see the supplementary materials) to locate the band edges from the dI/dV spectra of figure 1(c) and thus determine the energy bandgaps of ML and BL WSe2. They are 2.59 ± 0.07 eV and 1.83 ± 0.10 eV for ML and BL WSe2, respectively. The value of 2.59 eV for ML WSe2 is consistent with an early reported result [13], but as suggested in a recent study, the experimental spectral edge may not reflect the true electronic band edges of ML WSe2, and consequently the 'apparent' energy gap is usually overestimated in the STS spectrum by as much as the spin-split ΔSO at the K point of the Brillouin zone (BZ) [8, 14]. For ML WSe2, the ΔSO is as high as 0.4 eV [8, 14]. Figures 1(d) and (e) present the calculated energy bands by the density functional theory (DFT) for ML and BL WSe2, respectively, taking into account the spin–orbit coupling. The fact that the valence states at K are mainly of the dx2−y2 and dxy components of the metal atoms and that they have large in-plane momenta (k||) makes them less sensitive to STS measurements [8, 15]. The experimental spectral edge below Fermi energy does not necessarily reflect the Kv state of the valence band maximum (VBM) (see figure 1(d)) [8, 15], and, according to Zhang et al [8], the first peak close to the spectral edge of the valance band coincides with the lower spin-split band K2, which is at −1.61 eV in figure 1(c) (black). Given the 0.4 eV spin-splitting, the VBM is thus more likely located at −1.21 eV, as marked in the figure. For the conduction band, there is an ambiguity where the conduction band minimum (CBM) lies—the K or the Q valley—and the latter is approximately midway between Γ and K (refer to figure 1(d)) [14]. Recent STS experiment [8] suggested the Q-valley to be 0.08 eV below Kc. In any case, as the Qc-state contains much of the p-orbital component of the chalcogen atoms and has a lower k|| than the Kc-state, the STS spectral edge above the Fermi energy likely corresponds to the Qc-state as marked, and it is found to be at +1.18 eV. Therefore, we derive the indirect bandgap (i.e., Qc–Kv) of ML WSe2 to be about 2.39 eV.

For BL WSe2, the CBM is affirmed at Qc, which can be found at +0.99 eV in figure 1(c) (green). For the VBM, the energy difference between Γv and Kv (refer to figure 1(e)) is small. But as the STS measurement is more sensitive to the Γ-states, the spectral edge at −0.84 eV likely reflects the Γv-state, and we derive an energy gap of BL WSe2 to be 1.83 ± 0.10 eV, which corresponds to the indirect gap between Qc and Γv.

Because the two spectra in figure 1(c) are from two close-by positions of the same sample but of different thickness domains, it is reasonable to assume that the ML and BL share the same Fermi level. In figure 1(c), one notes the different magnitudes of the band-edge energy shifts of the valence- versus conduction-band edges: 0.37 eV for the VBM and 0.19 eV for the CBM, which give rise to an overall bandgap narrowing of 0.56 eV in BL WSe2 over that of ML. While the 0.19 eV shift of the CBM is for the same Qc bands, which may reflect the inter-layer coupling of the p-orbital electrons in BL WSe2, the 0.37 eV energy shift of the VBM may, however, be thought of as the change of the VBM from the K valley in ML WSe2 to Γ in BL film. On the other hand, we also note a band-bending effect at the boundary (i.e., step) of ML and BL domains. The latter may cause an additional shift of the band-edges, as illustrated in figure 2(a) and discussed below.

Figure 2.

Figure 2. STS of BL WSe2 at different locations. (a) Schematic diagram of electronic bands at the boundary between ML and BL WSe2, showing the band-bending and band-edge shifting effect (relative to the Fermi level) due to different electron affinity of the two films. (b), (c) STS differential conductance spectra of ML (b) and BL (c) WSe2 at varying distances from the step edge (see insets), revealing the band-bending effect.

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Band-bending close to the boundary of ML and BL domains is evidenced by the STS spectra taken at varying distances from a step, as shown in figures 2(b) and (c) for the ML and BL regions, respectively. Upon approaching the step, the spectra show a blue-shift for both domains, as illustrated in figure 2(a). The magnitudes of the upward shift (i.e., the band-bending) can be different in ML versus BL domains. This will result in an 'apparent' electronic band misalignment even far from the step where the spectra in figure 1(c) were measured.

The upward band-bending at both sides of the junction is unusual and interesting. We attribute it to the Fermi level pinning by the in-gap states associated with the edge atoms at the step. It was demonstrated that edge atoms of ML MoS2 clusters could induce in-gap states close to the VBM [16]. If the bulk of the film (i.e., away from the step) is nearly intrinsic, i.e., the Fermi level is in the middle of the bandgap, as suggested by figure 1(c), then the edge atoms at the junction will induce an upward band-bending, resulting in the band diagram of figure 2(a). This type of band-bending implies depletion of conduction electrons but accumulation of holes at the step, which may lead to some interesting electronic and optical effects.

We now make a comparison with the STS results from ML and BL MoSe2. Figure 3(a) shows an as-grown MoSe2 film of 1.4 MLs nominal coverage. As pointed out earlier, such films contain networks of the DB defects in both ML and BL domains. The conductance spectra presented in figure 3(b) were taken from points away from both steps and the DB defects in order to reveal the intrinsic properties of MoSe2 layers. Following the same procedure, we derive the energy gaps of ML and BL MoSe2 to be 2.25 ± 0.05 eV and 1.72 ± 0.05 eV, respectively, from the STS spectra. Unlike WSe2, there is no ambiguity about the CBM for ML MoSe2, which is in the K valley. The valence bands at K are spin-split by ∼0.18 eV [17]. Given that the STS does not necessarily reveal the band edges at K, the measured gap of 2.25 eV may represent an upper bound of the true gap of ML MoSe2. As for BL MoSe2, the VBM is known to be shifted to Γv, while the CBM is at Qc. Both are sensitive to STS measurements, so the STS-measured gap of 1.72 eV more likely reflects the true indirect gap (QcΓv) of BL MoSe2. Finally, similar to WSe2, both the conduction and valence band edges are seen shifted upon going from the ML to the BL of the sample.

Figure 3.

Figure 3. STM/S of ML and BL MoSe2. (a) STM image (size: 100 × 100 nm2, sample bias: −1.0 V) of an as-grown MoSe2 film of the nominal thickness of 1.4 MLs, showing the network of domain boundary defects (the bright lines) in both ML (darker area) and BL (brighter area) domains. (b) STS differential conductance spectra of ML (black) and BL (green) MoSe2.

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3.2. Exciton binding energies of ML and BL WSe2 and MoSe2

Having determined the electronic bandgaps by the STS of ML and BL WSe2 and MoSe2 in the above, we estimate exciton binding energies in these materials by comparing them with the PL results of the same materials. Indeed, giant excitonic effect in ultrathin TMDs, originating from enhanced Coulomb interaction between electrons and holes due to spatial confinement and reduced dielectric screening, is one of the remarkable properties of the 2D systems, which are attracting extensive theoretical and experimental attention lately [10, 14, 1827]. The reported size of exciton binding energy, a key quantity describing the strength of excitonic effects, has not been very consistent, ranging from ∼300 meV to about 1.0 eV for ML TMDs [10, 14, 1827]. Despite such variations, they represent an order of magnitude increase over that in the bulk [28] and in conventional 2D semiconductor quantum wells [29].

It is unfortunate that the PL measurements of the same MBE samples studied by the STS above are not successful. No band-edge emission was detected, and it was likely due to the quenching effect by the highly conductive HOPG substrate. We thus performed the PL experiments on exfoliated samples instead. Although non-ideal, the results still provide evidence of large exciton binding energies of the direct emissions in ML WSe2 and MoSe2 as well as reduced exciton binding energies in BL films for the indirect exciton emissions.

Figures 4(a)–(d) present the PL spectra for both MoSe2 (a, b) and WSe2 (c, d) ML and BL samples. Because the luminescence intensities of the ML samples are around one order of magnitude higher than the BL counterparts, we have shown the normalized PL intensities in all plots for clarity. Comparing figures 4(a) and (b), we find that the normalized PL spectra from MoSe2 are almost identical for the ML and BL films in both the emission peak position and the intensity ratio. The only noticeable difference is the intensity shoulder, seen in figure 4(b) around 1.6 eV, which can be attributed to the indirect exciton emission, according to its temperature-dependent behavior, as elaborated in the supplementary materials. The strong PL peaks at 1.657 eV and 1.629 eV are the direct exciton and trion emissions, respectively [17]. As ML MoSe2 has an energy bandgap of 2.25 eV, one deduces that the exciton binding energy in ML MoSe2 is about 0.59 eV, which likewise represents an upper bound due to the overestimate of the bandgap by STS. For BL MoSe2, the STS-measured gap (1.72 eV) reflects the indirect gap between Qc and Γv, while the dominant exciton emission (1.657 eV) is from the direct emission at K valley. So a simple subtraction of the two energies is not very meaningful. As noted earlier, the weak intensity shoulder at about 1.6 eV in figure 4(b) reflects the indirect exciton emission. By multiple peak fitting of the PL spectrum, we locate the indirect exciton emission peak at 1.602 eV, which we attribute to Qc–Kv emission by consideration of the second-order Moller–Plesset perturbation [29]. The local minimum in the conduction band at Γ is much higher than that at K (see figure 1(e)). According to the Moller–Plesset perturbation theory [30], phonon-assisted indirect emission Qc-Kv would overwhelm that of QcΓv. By noting that the energy gap between Qc and Kv is ∼1.81 eV, one deduces that the binding energy of indirect exciton in BL MoSe2 is about 0.21 eV.

Figure 4.

Figure 4. PL spectra of ML and BL MoSe2 and WSe2. (a) Normalized PL spectrum of ML MoSe2 measured at 10 K. Exciton and trion emissions are identified. (b) Normalized PL spectrum of BL MoSe2 measured at 10 K. Multiple-peak fitting (dashed green and red lines) resolves direct and indirect excition emissions and that of trion. (c) Normalized PL spectrum of ML WSe2 measured at 77 K, revealing excition and trion emissions. (d) Normalized PL spectrum of BL WSe2 measured at 77 K. Multiple-peak fitting (dashed green and red lines) resolves direct and indirect excition emissions besides a possible defect-related luminescence.

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For WSe2, our PL experiments have revealed complications, showing some unknown peaks when measured at 10 K (see supplementary materials). These peaks are likely related to defects or traps in the sample, and their presence hinders accurate assignments of exciton emission energies. On the other hand, we have found the PL spectra are clearer at lifted temperatures. The data measured at 77 K are used for extracting the exciton binding energies in WSe2, as shown in figures 4(c) and (d). For ML sample (figure 4(c)), the exciton and trion emissions are identified at 1.735 and 1.703 eV, respectively. By comparing with the STS-measured bandgap at the same temperature (2.39 eV), one deduces the exciton binding energy of 0.72 eV. For BL WSe2, we do not observe trion emission but a broad peak at about 1.56 eV (figure 4(d)). The broad peak vanishes at high temperatures (e.g., 180 K). So this peak is again likely related to defects. The PL evolution as a function of temperature (10–300 K) and the multi-peak fitting of the spectrum lead to the direct and indirect exciton emission peaks at 1.694 and 1.605 eV at 77 K, respectively. As we only know the indirect bandgap of BL WSe2 from the STS measurements (1.83 eV), noting further that there is a small energy difference between Γv and Kv, we deduce the indirect exciton binding energy in BL WSe2 to be about 0.23 eV. The reduced exciton binding energy in BL TMD is the result of the indirect gap, where the electron and holes do not share the same crystal momentum. The significant difference of the exciton binding energy between ML and BL TMD thus reflects the band-edge shift. Unfortunately, due to the ambiguity of the direct gap (K valley) in the STS measurement, we cannot estimate the direct-gap exciton binding energy of BL.

Table 1 summarizes the deduced exciton binding energies for both ML and BL WSe2 and MoSe2. We note that the binding energy of 0.59 eV for ML MoSe2 is in reasonable agreement with that found in ML MoSe2 grown on graphene/SiC (0.55 eV) [10], while that of ML WSe2 (0.72 eV) appears consistent with the previously reported value of 0.79 eV in reference [24] and 0.6 ± 0.2 eV in [25]. For BL TMD films, the exciton binding energies become smaller, but they are of the indirect excition emissions as compared to the direct emission in ML films.

Table 1.  Exciton binding energies in ML and BL WSe2 and MoSe2.

  ML (direct) BL (indirect)
WSe2 0.72 ± 0.07 eV 0.23 ± 0.10 eV
MoSe2 0.59 ± 0.05 eV 0.21 ± 0.05 eV

4. Conclusions

To conclude, we have grown atomically flat WSe2 films on HOPG by the method of MBE, in which the domain boundary network is absent. Differential conductance spectra taken from both ML and BL WSe2 and MoSe2 show not only semiconductor films and bandgap narrowing when changing the film thickness from ML to BL, but also shift of both conduction and valence band edges. Band-bending at the boundary (step) of ML and BL domains are evidenced, which is attributed to a Fermi-level pinning effect by states of the step-edge atoms. Energy bandgaps of the materials are derived and compared with the PL spectra from exfoliated samples. Exciton binding energies in ML and BL WSe2 and MoSe2 are estimated. The results provide another experimental evidence of the large excitonic effect in ultrathin TMDs as well as the apparent reduction of the exciton binding energy for the indirect emission in BL TMDs than that of the direct emission in ML samples.

Acknowledgments

We thank G B Liu for proving the DFT-calculated bands of WSe2 and MoSe2 and W Yao for some insightful comments. We acknowledge the support of the CRF grant (No. HKU9/CRF/13G) from the Research Grant Council of Hong Kong Special Administrative Region, China. MHX and JFJ acknowledge support from the MoE/RGC joint research grant (No. M-HKU709-12). HJL and MHX also acknowledge support from the internal grants of the University of Hong Kong. The work in SJTU was supported by the MOST of China (2013CB921902, 012CB927401) and the NSFC (11227404, 11374206).

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10.1088/2053-1583/2/3/034004