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Acknowledgments

Published under licence by IOP Publishing Ltd
, , Citation 2020 IOP Conf. Ser.: Mater. Sci. Eng. 756 011005 DOI 10.1088/1757-899X/756/1/011005

1757-899X/756/1/011005

Abstract

The CEC and ICMC Boards wish to thank our supporter and sponsors who have contributed to the 2019 CEC/ICMC Conference.

Full Acknowledgment information is available in the pdf.

SUPPORTER

• Fermilab

SPONSORS & ADVERTISERS

• Ability Engineering Technology, Inc.

• Aerospace Fabrication & Materials, LLC

• Beijing Sinoscience Fullcryo Technology Co., Ltd.

• Cryomech, Inc.

• Demaco Holland bv

• Fujikura Ltd.

• GE Global Research

• High Precision Devices

• Scientific Instruments, Inc.

Their contributions helped ensure the success of the 2019 Conference.

Producing the Open Access IOP Conference Series: Materials Science and Engineering (MSE) requires the dedicated effort of many individuals. The quality of the publication relies on the dedication of those who took time from their busy schedules to review and edit papers. The Boards wish to specifically acknowledge the efforts of Centennial Conferences for their editorial support, and the chief technical editors, John Weisend (CEC) and Balu Balachandran (ICMC). Their contributions to ensure a quality publication in a timely manner are greatly appreciated. The chief technical editors are indebted to the individual technical sub-editors for their time spent with reviewers and authors to get the final manuscripts ready for publication. John Weisend is also indebted to Gunilla Jacobsson for her assistance with the cumulative CEC subject index. The Boards also wish to thank all students and postdoctoral researchers from a number of universities for their service with the initial format checking of the papers submitted for peer review.

CEC/ICMC 2019 was managed by Paula Pair and Centennial Conferences. Recognizing this is a tremendous team effort, the Boards would especially acknowledge, in addition to Paula, all her staff – Annett Cady, Troy Christensen, Brion Jacobs, Andrew Kahl, Carrie Lian, Diane Mehling, Sydney Pair, and Letitia Xu – for the fantastic job they did wonderfully.

Last, but not least, the Conference would not have been possible without our exhibitors and their sustained commitment and support, and the effort and dedication of the attendees in preparing their presentations and papers, traveling to Hartford, Connecticut, and showing the professionalism and enthusiasm that makes the CEC/ICMC such a great Conference time after time.

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10.1088/1757-899X/756/1/011005