Abstract
This paper is devoted to the study of the mechanical and tribological properties of a-C:H:SiOx films deposited on a titanium alloy VT1-0 by a plasma chemical deposition method using pulsed bipolar bias voltage. It was shown that after deposition of 2 μm-thick a-C:H:SiOx film on a titanium alloy VT1-0 sample, the root-mean-square surface roughness Rq measured using atomic force microscopy decreased from 74 to 50 nm compared to the original substrate. The surface hardness H measured using nanoindentation increased from 3.3 to 12.4 GPa with an almost unchanged elasticity modulus E. As a result, the plasticity index (H/E) of titanium samples increased from 0.03 to 0.11, and the plastic deformation resistance (H3/E2) increased from 3 to 156 MPa. Deposition of a-C:H:SiOx film on the titanium alloy VT1-0 surface makes possible to reduce the friction coefficient from 0.3-0.6 to 0.1 and the wear rate from 6 · 10−4 to 7·10−6 mm3/Nm.
Export citation and abstract BibTeX RIS
Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.