This site uses cookies. By continuing to use this site you agree to our use of cookies. To find out more, see our Privacy and Cookies policy.
Brought to you by:
Paper The following article is Open access

Chemical bath deposited Nickel oxide thin film as electrode material for pseudocapacitors

, , , and

Published under licence by IOP Publishing Ltd
, , Citation T V Sathyan et al 2022 IOP Conf. Ser.: Mater. Sci. Eng. 1263 012019 DOI 10.1088/1757-899X/1263/1/012019

1757-899X/1263/1/012019

Abstract

We have synthesized thin films of nickel oxide (NiO) on silver and glass substrates, at very low temperature of 60°C, by chemical bath deposition (CBD) method. The precursor used consists of nickel nitrate and aqueous ammonia. Structural characteristics were studied using x-ray diffraction (XRD) and morphological studies were done using scanning electron microscopy (SEM). Ultraviolet-visible (UV-Vis) spectroscopy was used for optical studies. To investigate electrochemical behaviour of thin film electrode materials, cyclic voltammetry (CV) measurements were conducted. For electrochemical studies the galvanostatic charge/discharge (GCD) tests were also conducted. The formation of face centred cubic NiO structure was confirmed using XRD. The scanning electron microscopy images show uniform distribution of worm-like porous morphology. CV measurements revealed the capacitive behaviour of the films.

Export citation and abstract BibTeX RIS

Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.

Please wait… references are loading.