Abstract
Traditional fire risk assessment of semiconductor plant mainly relies on engineer experience from fields of fire control, chemistry, construction, semiconductor and insurance, and lacks a collaborative tool to integrate different design blueprints and locate high risk regions. In this paper, we introduce GIS into fire risk research for semiconductor industry, and propose a GIS-based spatial and quantitative method of fire risk assessment. Based on semiconductor plant spatial database extracted from diversified indoor maps, we set up a fire risk index system and integrate factors of potential fire source, operation risks of fabrication process, fire proof design and fire management to identify the high fire risk regions by using analytic hierarchy process. The proposed method improves spatial analysis capabilities of fire risk assessment for more and more complex semiconductor factories.
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