Paper The following article is Open access

Gis-Based Fire Risk Spatial Assessment for Semiconductor Plant

and

Published under licence by IOP Publishing Ltd
, , Citation Hongga Li and Xiaoxia Huang 2021 IOP Conf. Ser.: Earth Environ. Sci. 772 012080 DOI 10.1088/1755-1315/772/1/012080

1755-1315/772/1/012080

Abstract

Traditional fire risk assessment of semiconductor plant mainly relies on engineer experience from fields of fire control, chemistry, construction, semiconductor and insurance, and lacks a collaborative tool to integrate different design blueprints and locate high risk regions. In this paper, we introduce GIS into fire risk research for semiconductor industry, and propose a GIS-based spatial and quantitative method of fire risk assessment. Based on semiconductor plant spatial database extracted from diversified indoor maps, we set up a fire risk index system and integrate factors of potential fire source, operation risks of fabrication process, fire proof design and fire management to identify the high fire risk regions by using analytic hierarchy process. The proposed method improves spatial analysis capabilities of fire risk assessment for more and more complex semiconductor factories.

Export citation and abstract BibTeX RIS

Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.

Please wait… references are loading.
10.1088/1755-1315/772/1/012080