Electron and ion swarm data of fluorinated gases used in plasma processing

This paper presents recent data (from 1999-to date) of the theoretical and experimental work that has been done on electron and ion interactions at energies between thermal and 200 eV on the flourinated gases CHF₃, CF₄, C₂F₄, C₂F₆and c–C₄F₈, and their mixtures with Ar and N₂. These gases, used extensively in plasma processing, are currently the subject of intensive research. This review demonstrates that, in spite of the important progress gained in this line of research, many more measurements and refinements to the present theories are needed in order to obtain a complete picture of their interactions with electrons and ions and hence to have reliable and complete data sets with which a more realistic modeling of the gaseous discharges can be made.