Abstract
Due to the high breakdown voltage and better linearity of gallium nitride (GaN) high electron mobility transistor (HEMT), GaN based RF front-end is widely researched and studied. In this paper, a Ka-band cascode low-noise amplifier (LNA) designed with 100nm gate-length GaN-on-silicon technology is presented. With novel methods such as the introduction of high-pass filters and standing wave filtering capacitors, the LNA achieves a stable gain of 21-22.8dB and a noise figure (NF) of 0.9-1.3dB from 22GHz to 38GHz. The input and output return loss are better than-10dB in band of concern. This LNA occupies an area of 2.3mm × 0.9mm and consumes 265-mW DC power. Compared with silicon-on-insulator (SOI), indium phosphide (InP) and gallium arsenide (GaAs) LNAs, the proposed GaN LNA exhibits better performance of linearity, as well as competitive gain and NF.
Export citation and abstract BibTeX RIS
Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.