Abstract
The aim of the work is to investigate different approaches for the growth of planar gallium phosphide layers on silicon by molecular beam epitaxy. Atomic force microscopy and reflection high energy electron diffraction were used to study surface morphology and estimate the film domain structure. Developed growth technique with the use of a low-temperature AlGaP/GaP seeding layer allowed us to achieve atomically flat pseudomorphic single-phase GaP on Si(001).
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