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Influence of sputtering parameters on the main characteristics of ultra-thin vanadium nitride films

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Published under licence by IOP Publishing Ltd
, , Citation P I Zolotov et al 2018 J. Phys.: Conf. Ser. 1124 051030 DOI 10.1088/1742-6596/1124/5/051030

1742-6596/1124/5/051030

Abstract

We researched the relation between deposition and ultra-thin VN films parameters. To conduct the experimental study we varied substrate temperature, Ar and N2 partial pressures and deposition rate. The study allowed us to obtain the films with close to the bulk values transition temperatures and implement such samples in order to fabricate superconducting single-photon detectors.

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10.1088/1742-6596/1124/5/051030