Energy distribution of boron ions during plasma immersion ion implantation

The ion energy distribution during plasma immersion ion implantation (PIII) has been computed including charge transfer collisions in a dynamic sheath. The boron ion energy distribution has been derived experimentally from sheet resistance and SIMS measurements. The experimental results are consistent with theoretical predictions. Both the experimental and theoretical results indicate that during the PIII doping experiments boron ions have a relatively wide energy distribution and that many of the ions have low energies because of collisions in the sheath.