Abstract
An electron-beam heated source was used for the deposition of gold films on glass. The d.c. resistance change upon surface adsorption of elemental mercury has been measured for varying film thicknesses and annealing temperatures. An optimum film thickness in the region of 100 AA has been determined, with an optimum annealing temperature of 175 degrees C. It is postulated that surface activation occurs from crystallization and stress relief by annealing up to this temperature. For films of thickness greater than 150AA, the relative sensitivity for Hg detection declines with annealing to 200 degrees C but recovers with further annealing to 250 degrees C. The authors suggest a reduction of Hg sticking probability with increasing stress, and its subsequent restoration from stress relief as the film ruptures.
Export citation and abstract BibTeX RIS