Stability was examined for an AlAs/n-GaAs superlattice (SL), whose Si donors were confined to the GaAs layer. The SL was grown by MBE at 520°C and was annealed at a temperature (Ta) from 560 to 800°C. Up to Ta=600^°C, no sign of Al-Ga mixing was observed, and the amount of a DX centerlike trap was proportional to exp
(-0.65 eV/kTa). The increase in the trap was due to Si diffusion to the AlAs/GaAs interfaces with the activation energy of 1.3 eV for its diffusion coefficient. As increasing Ta above 650°C, Al-Ga mixing was accelerated and a decrease in carrier concentration and an increase in persistent photoconductivity were observed.