Advanced Plasma Science and Its Applications for Nitride and Nanomaterials

This special issue consists of peer-reviewed papers based on presentations at the 7th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2015) held at Nagoya University, Nagoya, Japan during March 26–31, 2015. The ISPlasma2015 Organizing Committee is associated with the project "Tokai Region Nanotechnology Manufacturing Cluster," implemented by MEXT (Ministry of Education, Culture, Sports, Science and Technology) Knowledge Cluster Initiative. The scope of the symposium is advanced plasma science and technology, including plasma sources, diagnostics, modeling and/or simulation of plasma enhanced processing, and its application for processing and manufacturing of wide-bandgap materials and nanomaterials research, also application for plasma biology and medicine.

A total numbers of 616 papers including 76 plenary & invited talks and 150 contributed talks were presented at the symposium, attended by 868 participants including 251 from overseas. This special issue contains 92 papers which were submitted based on presentations at the symposium and have met the standard reviewing process of Japanese Journal of Applied Physics. The ISPlasma2015 committee sincerely hopes that this special issue forms a valuable contribution to the knowledge of plasma science and its applications, and stimulates further development of the field.

• January 2016
• Publication Committee for the Special Issue of ISPlasma2015

• GUEST EDITORS
• Akihiro Wakahara (Toyohashi University of Technology)
• Osamu Nakatsuka (Nagoya University)
• Minoru Sasaki (Toyota Technological Institute)
• Kazuo Terashima (Toyohashi University of Technology)
• Hiroshi Amano (Nagoya University)
• Takashi Egawa (Nagoya Institute of Technology)
• Yasufumi Fujiwara (Osaka University)
• Mineo Hiramatsu (Meijo University)
• Ryoichi Ichino (Nagoya University)
• Yasushi Inoue (Chiba Institute of Technology)
• Masafumi Ito (Meijo University)
• Makoto Kasu (Saga University)
• Hiroki Kondo (Nagoya University)
• Seiichi Miyazaki (Nagoya University)
• Kazuaki Sawada (Toyohashi University of Technology)
• Makoto Sekine (Nagoya University)
• Yuichi Setsuhara (Osaka University)
• Masaharu Shiratani (Kyushu University)
• Hirofumi Takikawa (Toyohashi University of Technology)
• Yoshimi Watanabe (Nagoya Institute of Technology)