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Growth of Nanocubic MgO on Silicon Substrate by Pulsed Laser Deposition

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Published 21 January 2013 Copyright (c) 2013 The Japan Society of Applied Physics
, , Citation Satoru Kaneko et al 2013 Jpn. J. Appl. Phys. 52 01AN02 DOI 10.7567/JJAP.52.01AN02

1347-4065/52/1S/01AN02

Abstract

Magnesium oxide (MgO) prepared by both pulsed laser deposition and sputtering methods showed constriction of lattice constants. To emphasize the effect of the constriction of lattice constants, MgO prepared at high oxygen atmosphere and high substrate temperature, resulted in the growth of cubic-shaped magnesium oxide (MgO) nanoparticles on a Si substrate. In oxygen atmosphere, the nanocubic MgO was scattered on the substrate without the Si surface being covered by a MgO thin film. Interestingly, the growth of nanocubic MgO was restrained on the samples prepared in nitrogen atmosphere. The formation of nanocubic MgO is related to the deposition pressure as well as the etching effect provided by oxygen atmosphere.

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10.7567/JJAP.52.01AN02