Abstract
We designed and fabricated 70×75 µm2 arrayed waveguide grating demultiplexer consisting of Si slab and wire waveguides on a silicon-on-insulator substrate. By optimizing the connection between components and the layout of arrayed waveguides, internal light scattering and the increase in phase error were suppressed. As a result, clear demultiplexing characteristics were observed with a channel spacing of 8 nm and a sidelobe level of -22 dB in the wavelength range from 1.5 to 1.6 µm.
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