Abstract
The preparation of PbTiO3 thin films by multiple cathode rf-magnetron sputtering was investigated. The effects of incident Pb/Ti ratio, the kind of substrates, substrate temperatures and film thickness on the crystalline structure of the PbTiO3 thin films prepared were studied. The thin films with perovskite PbTiO3 structure on Si wafers were obtained by deposition at an incident Pb/Ti ratio of 1.2 at a substrate temperature of 460∼500°C. The X-ray photoemission spectroscopy (XPS) depth profile revealed that less reaction of the thin films with the Si substrate was observed at the interface at lower substrate temperatures.