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Confirmation of the Correlation between the Electrical Hysteresis and Silicon Dangling Bond Density in Silicon Nitride by UV Irradiation of Nearly Hysteresis Free Metal-Nitride-Silicon Capacitors

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Copyright (c) 1991 The Japan Society of Applied Physics
, , Citation W. S. Lau W. S. Lau and C. H. Goo C. H. Goo 1991 Jpn. J. Appl. Phys. 30 L1996 DOI 10.1143/JJAP.30.L1996

1347-4065/30/12A/L1996

Abstract

Previously, Lau [W. S. Law: Jpn. J. Appl. Phys. 29 (1990) L690] has pointed out that part of the hysteresis ΔV+ in MNS (Metal-Nitride-Silicon) capacitors is correlated to the spin density measured by electron spin resonance and the other part of the hysteresis ΔV- is correlated to defects close to the nitride/silicon interface. The spin density was thought to originate from silicon dangling bonds in the silicon nitride. 254 nm ultraviolet irradiation, which was known to be capable of producing silicon dangling bonds in silicon nitride, was found to induce a large ΔV+ in nearly hysteresis free MNS (Metal-Nitride-Silicon) capacitors, thus confirming that ΔV+ is correlated to silicon dangling bonds.

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10.1143/JJAP.30.L1996