Surface-sensitive Chemical Analysis of Organic Insulating Thin Films Using Negative Secondary Ions Induced by Medium Energy C60 Impacts

Kouichi Hirata; Yuichi Saitoh; Atsuya Chiba; Keisuke Yamada; Kazumasa Narumi

doi:10.1143/APEX.4.116202

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Surface-sensitive Chemical Analysis of Organic Insulating Thin Films Using Negative Secondary Ions Induced by Medium Energy C₆₀ Impacts

Kouichi Hirata, Yuichi Saitoh¹, Atsuya Chiba¹, Keisuke Yamada¹ and Kazumasa Narumi¹

Published 10 November 2011 • ©2011 The Japan Society of Applied Physics
Applied Physics Express, Volume 4, Number 11

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Author affiliations

National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8565, Japan

¹ Takasaki Advanced Radiation Research Institute (TARRI), Japan Atomic Energy Agency (JAEA), Takasaki, Gumma 370-1292, Japan

Dates

Received 30 September 2011
Accepted 22 October 2011
Published 10 November 2011

Citation

Kouichi Hirata et al 2011 Appl. Phys. Express 4 116202

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DOI

https://doi.org/10.1143/APEX.4.116202

PACS

82.80.Rt, 77.55.-g, 81.70.Jb

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Abstract

We report on the surface-sensitive chemical analysis of organic insulating thin films using negative secondary ions (N-SIs) induced by C₆₀ impacts in the medium energy range from several tens to several hundreds keV. The incident C₆₀ energy dependence of emission yields of characteristic N-SIs for poly(methyl methacrylate) and charging effects on the N-SI mass spectra were investigated using time-of-flight SI mass spectrometry. Our results show that medium energy C₆₀ impacts stably provide considerably high characteristic N-SI yields without charge compensation, and demonstrate that time-of-flight SI mass spectrometry with medium energy C₆₀ impacts is advantageous for the highly-sensitive chemical analysis of organic insulators.

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