Calculation of the ion current distribution along the cathode in glow discharge under the existence of a periodic relief and an insulating film of varying thickness on its surface

An approximate analytical expression for the ion current density near the cathode in glow discharge is obtained in the presence of a periodic relief of small amplitude and an insulating oxide film of varying thickness on its surface. It is found that ion focusing at the cathode sections with the minimum film thickness, located on any parts of the surface relief, takes place, resulting in an increase of the film thickness non-uniformity with time. Therefore, under the existence of an oxide film on the cathode, its sputtering in glow discharge is determined mainly by the film thickness non-uniformity and not by the surface relief.