Abstract
SiGe lines epitaxially grown in silicon oxide nano-trenches on Si substrate are characterized by transmission electron microscopy (TEM) based techniques. Due to the high aspect ratio of the trenches most of the extended crystallographic defects are limited to the bottom of the lines. Few of them are still observed at the top of the lines and emerge in the cap above the lines. The SiGe composition is not homogenous in the width of the line and in the cap. This is linked to the formation of {111} facets. This variation of composition is not observed for the lines with an actual width narrower than 20nm.
Export citation and abstract BibTeX RIS
Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.