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The following article is Open access

PECVD/ECR/HWCVD Multichamber System with Robotic Substrate Handling System for deposition of Thin Film Electronic Devices

Published under licence by IOP Publishing Ltd
, , Citation P Rava 2012 J. Phys.: Conf. Ser. 390 012007 DOI 10.1088/1742-6596/390/1/012007

1742-6596/390/1/012007

Abstract

The present work reports on progress in the design of modular UHV cluster tool multichamber systems. A wide range of processes has been implemented in the Deposition Process Chambers (DPC's), including rf-PECVD, vhf-PECVD, ECR-PECVD and HWCVD. A wide range of intrinsic and doped amorphous and microcrystalline silicon and silicon alloy materials have been produced and have been used in the fabrication of several types of electronic devices such as solar cells, Light Emitting Devices (LED's), Thin Film Transistors (TFT's), etc. using multichamber systems at several laboratories worldwide.

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10.1088/1742-6596/390/1/012007