The Deposition of Silver (Ag) on a Glass Substrate (Sio₂) using Direct Current Sputtering Method

The research's aims are to calculate the absorbance and the thickness value of the silver (Ag) thin layer formed on the glass substrate (SiO₂) at various visible wavelengths. The silver (Ag) thin layer was formed using Direct Current Sputtering method. The research showed that the highest absorbance value on the glass (SiO₂) substrate was 4.000 with wavelengths 287.50 nm. While, the lowest absorbance value on the glass (SiO₂) substrate was -4.000 with wavelengths 262.50 nm and 243 nm. The lowest absorbance value is estimated because of the part of the substrate that has not been completely coated so that the part is not absorbed at all. Using Swanepoel equation we obtained the thickness value of the thin layer equal to 4.692663316 nm with sputtering time of 15 minutes.