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SEMICONDUCTOR DEVICES

ESD protection design for the gate oxide of an RF-LDMOS

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2012 Chinese Institute of Electronics
, , Citation Jiang Yibo et al 2012 J. Semicond. 33 044007 DOI 10.1088/1674-4926/33/4/044007

1674-4926/33/4/044007

Abstract

This paper presents the investigation of integrated electro-static discharge (ESD) protection design for the gate oxide of an RF-LDMOS (radio frequency lateral double diffusion MOS). Through a comprehensive discussion of experimental and simulated results, a cascoded NMOS is presented as appropriate integrated gate oxide ESD protection with a high holding voltage and a flexible ESD design window.

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10.1088/1674-4926/33/4/044007