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A Powerful Soft X-ray Source for X-ray Lithography Based on Plasma Focusing

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1402-4896/57/4/003

Abstract

A source of soft X-ray emission (9–14Å) based on the miniature 15kJ plasma focus was developed and tested. The X-ray emission was channelled along the chamber axis through an opening in the inner electrode (anode). A regime with a mean output of more than 100 J per discharge was found. At a discharge current of 280kA and repetition rate of 3.5Hz achieved by the device, its lifetime was estimated to be 107 commutations (about a year of continuous operation). A demonstration experiment on irradiation of an X-ray resist is discussed.

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