This site uses cookies. By continuing to use this site you agree to our use of cookies. To find out more, see our Privacy and Cookies policy.
Brought to you by:

The gain and loss of energy by electrons in the RF-CCP sheath

, and

Published 1 April 2009 2009 IOP Publishing Ltd
, , Citation Brian George Heil et al 2009 J. Phys. D: Appl. Phys. 42 085205 DOI 10.1088/0022-3727/42/8/085205

0022-3727/42/8/085205

Abstract

The exact mechanism for the heating of electrons in the sheath of radio frequency capacitively coupled plasma (RF-CCP) discharges is poorly understood. A hybrid one-dimensional model of a RF-CCP discharge is used to study this problem by tracking electron trajectories and electron energy change in the RF-CCP sheath. This study shows that the Ohmic electric field, the field due to conduction current, can have an effect on electron heating in the plasma sheath. Both the ambipolar and the Ohmic electric field can repel low energy electrons and reduce their interaction with the changing electric field in the sheath region. A comparison is made between the more realistic Brinkmann fluid sheath model and a hard wall approximation. For energetic electrons, the hard wall approximation accurately models electron heating. However, the hard wall approximation does not accurately model the heating of lower energy electrons or allow for electron losses to the electrode. A comparison is also made between the electron energy probability function calculated using a Monte Carlo simulation with and without the effects of the sheath.

Export citation and abstract BibTeX RIS

Please wait… references are loading.
10.1088/0022-3727/42/8/085205