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Fabrication of GaAs quantum dots by droplet epitaxy on Si/Ge virtual substrate

S Bietti1, S Sanguinetti1, C Somaschini1, N Koguchi1, G Isella2, D Chrastina2 and A Fedorov2

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We present here the fabrication, via droplet epitaxy, of GaAs/AlGaAs quantum dots with high optical efficiency on Si. The growth substrate lattice parameter was adapted to that of (Al)GaAs via Ge virtual substrates (GeVS). The samples clearly show the presence of quantum dot self-assembly, with the designed shape and density. Photoluminescence measurements, performed at low temperature, show an intense emission band from the quantum dots.


PACS

81.07.Ta Quantum dots

81.16.Dn Self-assembly

78.55.Cr III-V semiconductors

78.67.Hc Quantum dots

68.55.A- Nucleation and growth

Subjects

Condensed matter: electrical, magnetic and optical

Semiconductors

Surfaces, interfaces and thin films

Nanoscale science and low-D systems

Dates

Issue 1 (2009)



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    S Bietti et al 2009 IOP Conf. Ser.: Mater. Sci. Eng. 6 012009

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