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Dependence of deposition parameters and layer thickness on the characteristics of Nd-Fe-B thin films

S Madeswaran1, R Tokumaru2, S Tamano2, S Goto2, K Tokiwa1,2 and T Watanabe1

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Textured Nd-Fe-B thin films with hard magnetic properties were prepared on a Ta (110) buffer layered glass substrates using radio frequency (RF) sputtering deposition. We investigated the influence of substrate temperature, sputtering gas pressure, RF power and film thickness on their microstructural and magnetic properties. Composition in the Nd-Fe-B thin films prepared using the same target with an Nd/Fe ratio of 0.32 was markedly changed (varied between 0.21 and 0.31) depending on the Ar pressure and the RF power. Well-textured Nd-Fe-B films grown at a deposition pressure of 7.0 Pa, a temperature of 550 °C, and a power of 100 W revealed better magnetic properties: Jr = 1.1 T, Hc = 1130 kA/m and BH(max) = 236 kJ/m3.


PACS

75.70.Ak Magnetic properties of monolayers and thin films

75.60.Ej Magnetization curves, hysteresis, Barkhausen and related effects

75.50.Ww Permanent magnets

68.55.-a Thin film structure and morphology

81.15.Cd Deposition by sputtering

68.55.A- Nucleation and growth

Subjects

Condensed matter: electrical, magnetic and optical

Surfaces, interfaces and thin films

Dates

Issue 1 (2009)



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