N Unno et al 2009 J. Phys.: Conf. Ser. 191 012014 doi:10.1088/1742-6596/191/1/012014
N Unno1,2, J Taniguchi1, S Ide1, S Ishikawa1, Y Ootsuka3, K Yamabe3 and T Kanbara3
Show affiliationsIn the next generation, a strong need exists for nano-scale electrode and electric probe for measuring the electrical characteristics of very small material, such as organic semiconductor. Liftoff technique or etching process with electron beam lithography (EBL) is generally used for fabricating the nano-scale electrode. Although EBL is able to fabricate the sub-10 nm gap pattern, its throughput is not enough to satisfy a demand for mass-producing. Moreover, it is troublesome to fabricate the three-dimensional metal pattern using these processes. In this study, three-dimensional metal nanoimprint technique with metal oxide release layer was examined. As a result, three-dimensional gold pattern was obtained in one shot on the polyethylene terephthalate substrate by using the spin on glass mold coated by Cr2O3.
81.16.Rf Nanoscale pattern formation
68.37.Hk Scanning electron microscopy (SEM) (including EBIC)
68.37.Ps Atomic force microscopy (AFM)
73.63.-b Electronic transport in nanoscale materials and structures
Issue 1 (2009)
N Unno et al 2009 J. Phys.: Conf. Ser. 191 012014
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