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Study of reactive ion etching for reverse tone nanoimprint process

Y Tsuji, M Yanagisawa, H Yoshinaga and K Hiratsuka

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[1]
Yanagisawa M, Tsuji Y, Yoshinaga H and Hiratsuka K 2008 21st Int. Microprocesses and Nanotechnology Conf. vol 29D-9-125 p 400-401

[2]
Miller M, Doyle G, Stacey N, Xu F, Sreenivasan S V, Watts M and LaBrake D L 2005 Proc. SPIE 5751 994
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