Y Tsuji et al 2009 J. Phys.: Conf. Ser. 191 012010 doi:10.1088/1742-6596/191/1/012010
Y Tsuji, M Yanagisawa, H Yoshinaga and K Hiratsuka
Show affiliationsWe have used reverse nanoimprint for fabricating diffraction gratings of distributed feedback laser diodes. Generation of residues in the etching process of resin is a serious issue leading to poor line edge roughness of the grating patterns. We have found that the residues are composed of oxide products from Si-containing resin. We have successfully suppressed the generation of the residues by optimizing oxygen partial pressure of reactive ion etching (RIE). We have also succeeded in effectively removing the residues by utilizing sputtering effect of RIE.
42.82.Cr Fabrication techniques; lithography, pattern transfer
Issue 1 (2009)
Y Tsuji et al 2009 J. Phys.: Conf. Ser. 191 012010
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